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Program of the 4th Workshop
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 21st Century COE Program
Fourth Hiroshima International Workshop on
Nanoelectronics for Tera-Bit Information Processing
Date: September 16 (Friday), 2005 9:00-18:00
Place: Reception Hall, Faculty Club Hiroshima University
Contact: Emi Shiraishi
Phone: +81-82-424-6969 / Fax: +81-82-424-6969
E-mail: shiraishi sxsys.hiroshima-u.ac.jp
 POSTER PDF(160KB)
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Program
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| 9:00-9:10 |
Welcome Remarks |
| 9:10-9:30 |
Opening Address
Taizo Muta, President, Hiroshima University
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| 9:30-9:50 |
Recent Progress of the COE
Atsushi Iwata, COE Leader, Graduate School of Advanced Sciences and Matter, Hiroshima University
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| 9:50-10:30 |
[Invited] Challenges and Opportunitie
Tadahiro Kuroda, Keio University, Japan
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| 10:30-11:10 |
[Invited] High-k Gate Dielectrics for Future CMOS Technology
T.P.Ma, Yale University. USA
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| 11:10-11:50 |
[Invited] Sub-20 nm Novel Silicon-Based Transistors
J.C.S. Woo, UCLA, USA
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| 11:50-13:10 |
Lunch Break |
| 13:10-13:50 |
[Invited] Perspective on Emerging Devices and their Impact on Scaling Technologies
S. Biesemans, IMEC
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| 13:50-14:30 |
[Invited] Device Simulation for Nano MOSFET and Scaing Issues
Y. J. Park, Seoul National University, Korea
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| 14:30-15:10 |
[Invited] Conventional Bulk and Bulk+ Architectures for 45 nm Node
F. Boeuf, ST Microelectronics, France
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| 15:10-15:20 |
Break |
| 15:20-16:00 |
[Invited] Current Status of PVD Hf-Based High-k Gate Stack
- Process Improvement on Drive Current
Masaaki Niwa, Matsushita Electric, Japan
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| 16:00-16:40 |
Current Activities in Device and Process R＆D of the COE
Hideo Sunami, S. Miyazaki, S. Yokoyama, K. Shibahara, and
A. Nakajima Hiroshima University
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| 16:40-18:00 |
POSTER SESSION |
| P- |
1 |
A 3D Integration Architecture utilizing Wireless Interconnections for Implementing Hyper Brains
Atsushi Iwata, Mamoru Sasaki, Takeshi Yoshida, Seiji Kameda, Hiroshi Ando, Masahiro Ono,Kanya Sasaki, Daisuke Arizono, and Takamaro Kikkawa |
| P- |
2 |
A 0.95mW/1.0Gbps Spiral-Inductor Based Wireless Chip-Interconnect with Asynchronous Communication Scheme
Mamoru Sasaki and Atsushi Iwata |
| P- |
3 |
A brain-type vision system using a 3-dimensional integration with local and global wireless interconnections
Seiji Kameda, Nobuo Sasaki, Daisuke Arizono, Masaki Odahara, Mamoru Sasaki, Takamaro Kikkawa, and Atsushi Iwata |
| P- |
4 |
Robust Face Recognition Methods under Illumination Variations toward Hardware Implementation on 3DCSS
H. Ando, N. Fuchigami, M. Sasaki, and A. Iwata |
| P- |
5 |
A Layout Method of 20GHz Global Clock Distribution
Mitsuru Shiozaki, Atsushi Mori, Atsushi Iwata, and Mamoru Sasaki |
| P- |
6 |
A Robust Modular Learning Model with Addition and Integration of Modules
Masahiro Ono, Mamoru Sasaki, and Atsushi Iwata |
| P- |
7 |
A window-based stereoscopic system using a weighted average of costs aggregated with window size reduction
Kan'ya Sasaki, Seiji Kameda, and Atsushi Iwata |
| P- |
8 |
A CMOS RF Front-End using Radiation Oscillator for Short-Range Wireless Communication
Toru Mukai, Atsushi Iwata, and Mamoru Sasaki |
| P- |
9 |
A 1V Supply Low noise CMOS Amplifier Using Noise Reduction Technique of Autozeroing and Chopper Stabilization
Yoshihiro Masui, Takeshi Yoshida, Takayuki Mashimo, Mamoru Sasaki, and Atsushi Iwata |
| P- |
10 |
Systems with Recognition and Learning Capability Based on Associative Memory
Hans Juergen Mattausch and Tetsushi Koide |
| P- |
11 |
Real-Time Multi-Object Tracking Based on Highly Parallel Image Segmentation and Pattern Matching
Tetsushi Koide, Hans Juergen Mattausch, Takashi Morimoto, Hidekazu Adachi, and Kosuke Yamaoka |
| P- |
12 |
Associative Memory Based Hardware Design for an OCR System and Prototyping with FPGA
Ali Ahmadi, Md. Anwarul Abedin, Kazuhiro Kamimura, Yoshinori Shirakawa, Kazuhiro Takemura,Hans Juergen Mattausch, and Tetsushi Koide |
| P- |
13 |
Fully-Parallel Associative Memory Architecture Realizing Minimum Euclidean Distance Search
Md. Anwarul Abedin, Kazuhiro Kamimura, Ali Ahmadi, Hans Juergen Mattausch, and Tetsushi Koide |
| P- |
14 |
Image-Scan Video Segmentation Architecture Based on Embedded Memory Technology
Takashi Morimoto, Hidekazu Adachi, Kosuke Yamaoka, Tetsushi Koide, and Hans Juergen Mattausch |
| P- |
15 |
CAM-Based Huffman Coding Architecture for Real-Time Applications
Takeshi Kumaki, Yasuto Kuroda, Tetsushi Koide, Hans Juergen Mattausch, Hideyuki Noda,Katsumi Dosaka, Kazutami Arimoto, and Kazunori Saito |
| P- |
16 |
Unified Data/Instruction Cache with Distributed Crossbar, Hidden Precharge Pipeline and Dynamic CMOS Logic
Koh Johguchi, Zhaomin Zhu, Ken-ichi Aoyama, Yuya Mukuda, Hans Juergen Mattausch,Testushi Koide, and Tetsuo Hironaka |
| P- |
17 |
Time-Domain-Based Modeling of Carrier Transport in Lateral p-i-n Photodiode
G. Suzuki, K. Konno, D. Navarro, N. Sadachika Y. Mizukane, O. Matsushima, T. Ezaki,Mitiko Miura-Mattausch, and S. Yokoyama |
| P- |
18 |
Shot Noise Modeling in MOSFETs under Sub-threshold Condition
Yoshioki Isobe, Dondee Navarro, Youichi Takeda, Kiyohito Hara, Tatsuya Ezaki, and Mitiko Miura-Mattausch |
| P- |
19 |
P-19 Wireless interconnects for UWB signal transmission in ULSIs Interconnection
T. Kikkawa, N. Sasaki, P. K. Saha, K. Kimoto, and M. Nitta |
| P- |
20 |
The Development of UWB Gaussian Monocycle Pulse Synchronization Circuit based on 0.18μm CMOS Technology
Nobuo Sasaki, Pran Kanai Saha, and Takamaro Kikkawa |
| P- |
21 |
Effect of Supercritical Fluid Extraction Process on Self-assembled Porous Silica Films
Kouji Isari, Nobuyuki Kawakami, Yoshito Fukumoto, and Takamaro Kikkawa |
| P- |
22 |
Impulse-based UWB transmitter in 0.18 μm CMOS for wireless interconnect in future ULSI
P. K. Saha, N. Sasaki, and T. Kikkawa |
| P- |
23 |
Data Transmission Characteristics of Integrated Linear Dipole Antennas for UWB Communication in Si ULSI
K. Kimoto, N. Sasaki, M. Nitta, and T. Kikkawa |
| P- |
24 |
Interference of Digital Noise with Integrated Dipole Antenna for Inter-chip Signal Transmission In ULSI
M. Nitta and T. Kikkawa |
| P- |
25 |
Front-End Technologies for nano-scale MOSFETs
Kentaro Shibahara |
| P- |
26 |
Workfunction Tuning of Fully-Silicided NiSi Gate with Poly-Si Predoping
Takuji Hosoi, Kousuke Sano, Masaki Hino, Norihiro Ooishi, and Kentaro Shibahara |
| P- |
27 |
Development of Three-Dimensional Beam-Channel MOS Transistors
Hideo Sunami, Kei Kobayashi, Shunpei Matsumura, Koji Yoshikawa, and Kiyoshi Okuyama |
| P- |
28 |
Constraint of Source/Drain Formation with Plasma Doping Applied for Beam Channel Transistor on SOI
Kei Kobayashi, Kiyoshi Okuyama, Koji Yoshikawa, and Hideo Sunami |
| P- |
29 |
Characterization of Newly Developed 3-D Parallel-Triple Gate MOS Transistor
Kiyoshi Okuyama, Koji Yoshikawa, and Hideo Sunami |
| P- |
30 |
Control of Charged States of Silicon Quantum Dots and Their Application to Floating Gate MOS Memories and Light Emitting Diodes
Seiichi Miyazaki |
| P- |
31 |
Impact of Rapid Thermal Annealing on ALCVD-Al2O3/Si3N4/Si(100) StackStructures --Photoelectron Spectroscopy
H. Murakami, F. Takeno, A. Ohta, S. Higashi , S. Miyazaki, K. Komeda, M. Horikawa, and K. Koyama |
| P- |
32 |
Formation of Si Nano-crystals by Millisecond Annealing of SiOx Films using Thermal Plasma Jet
Seiichiro Higashi, Tatsuya Okada, Noto Fujii, Naohiro Koba, Hideki Murakami, and Seiichi Miyazaki |
| P- |
33 |
Fabrication of Multiply-Stacked Structures Consisting of Si-QDs with Ultrathin SiO2 and Its Application of Light Emitting Diodes
Katsunori Makihara, Yoshihiro Kawaguchi, Hideki Murakami, Seiichiro Higashi, and Seiichi Miyazaki |
| P- |
34 |
Characterization of Electronic Charged States of P-doped Si Quantum Dots Using AFM/Kelvin Probe
Katsunori Makihara, Hideki Murakami, Seiichiro Higashi, and Seiichi Miyazaki |
| P- |
35 |
Characterization of Charge Trapping and Dielectric Breakdown of HfAlOx/SiON Dielectric Gate Stack
Yanli Pei, Satoru Nagamachi, Hideki Murakami, Seiichiro Higashi, Seiichi Miyazaki,Takaaki Kawahara, Kazuyoshi Torii, and Yasuo Nara |
| P- |
36 |
Characterization of Chemical Bonding Features of NH3-Annealed Hafnium Oxides Formed on Si(100)
H. Nakagawa, A. Ohta, H. Murakami, S. Higashi, and S. Miyazaki |
| P- |
37 |
XPS Study of Ultrathin GeO2/Ge System
Akio Ohta, Hiroaki Furukawa, Hiroshi Nakagawa, Hideki Murakami, Seiichiro Higashi, and Seiichi Miyazaki |
| P- |
38 |
Phase Transformation of Amorphous Si Films in Millisecond Time Domain Induced by Thermal Plasma Jet Irradiation
H. Kaku, S. Higashi, T. Okada, H. Murakami, and S. Miyazaki |
| P- |
39 |
Characterization of Multi Step Electron Charging to Silicon-Quantum-Dot Floating Gate by Applying Pulsed Gate Biases
T. Nagai, M. Ikeda, Y. Shimizu, S. Higashi, and S. Miyazaki |
| P- |
40 |
Decay Characteristics of Electronic Charged States of Si Quantum Dots as Evaluated by an AFM/Kelvin Probe Technique
Junichiro Nishitani, Katsunori Makihara, Mitsuhisa Ikeda, Hideki Murakami, Seiichiro Higashi,and Seiichi Miyazaki |
| P- |
41 |
Analysis of Transient Temperature Profile During Thermal Plasma Jet Annealing of Si Films on Quartz Substrate
T. Okada, S. Higashi, H. Kaku, N. Koba, H. Murakami, and S. Miyazaki |
| P- |
42 |
Status of Research on Optical Interconnection in LSI
Shin Yokoyama |
| P- |
43 |
Design and Simulation of Ring Resonator Optical Switches using Electro- and Magneto-Optic Materials
Yuichiro Tanushi and Shin Yokoyama |
| P- |
44 |
Groove-Buried Optical Waveguides Based on Metal Organic Solution-Derived Ba0.7Sr0.3TiO3Thin Films
Zhimou Xu, Masato Suzuki, Yuichiro Tanushi, Keita Wakushima, and Shin Yokoyama |
| P- |
45 |
Structural and Optical Properties of Electro-Optic Material: Sputtered (Ba,Sr)TiO3
Masato Suzuki, Zhimou Xu, Yuichiro Tanushi, and Shin Yokoyama |
| P- |
46 |
Integration of High-Speed Photodetectors on Si LSI.124
Masayuki Kitaura, Yoshio Mizukane, Shin Yokoyama, and Mitiko Miura-Mattausch |
| P- |
47 |
Development of Photodetectors using Si Quantum Dots
Mitsuhisa Ikeda, Masayuki Kitaura, Seiichi Miyazaki, and Shin Yokoyama |
| P- |
48 |
Fabrication of Spin-Coat Optical Waveguides for Optically Interconnected LSI and Influence of Fabrication Process on Lower Layer MOS Capacitors
Tetsuo Tabei, Kazuhiko Maeda, Shin Yokoyama, and Hideo Sunami |
| P- |
49 |
Smooth Cu Thin Film Fabricated by H2 Addition Sputtering
Masahiro Ooka and Shin Yokoyama |
| P- |
50 |
Characterization and application of SiON gate dielectrics
Anri Nakajima, Shiyang Zhu, Takuo Ohashi, and Hideharu Miyake |
| P- |
51 |
Infuence of Bulk Bias on Negative Bias Temperature Instability of pMOSFETs with Ultrathin Plasma-Nitrided Gate Oxide
Shiyang Zhu, Anri Nakajima, Takuo Ohashi, and Hideharu Miyake |
| P- |
52 |
[Invited] Dynamic Behavior of Human Eye
Roland Kempf, Yuichi Kurita, Yoshichika Iida, Makoto Kaneko, Hiromu Mishima,Hidetoshi Tsukamoto, and Eiichiro Sugimoto |
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| 18:00 |
BANQUET |
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Events
COE Seminar
4th Program